Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets

Surface and Coatings Technology

Volumn 238, Issue , 2014, Pages 152-157

  Kubart, Tomáš ^a   Čada, Martin ^b   Lundin, Daniel ^c   Hubička, Zdeněk ^b  

^a UPPSALA UNIVERSITY   (Sweden)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c UNIVERSITÉ PARIS SUD   (France)

Author keywords

HiPIMS; Ionized flux fraction; Reactive sputtering

Indexed keywords

DISCHARGE POWER; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIPIMS; IONIZED FLUX FRACTION; METAL FLUXES; PULSE ON-TIME; PULSE POWER; TARGET MATERIALS;

METALS; NICKEL; REACTIVE SPUTTERING;

IONIZATION;

EID: 84890859019     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.10.064     Document Type: Article

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