Boron-rich plasma by high power impulse magnetron sputtering of lanthanum hexaboride

Journal of Applied Physics

Volumn 112, Issue 8, 2012, Pages

  Oks, Efim M ^a   Anders, André ^b  

^a TOMSK STATE UNIVERSITY OF CONTROL SYSTEMS AND RADIOELECTRONICS   (Russian Federation)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY SPECTROMETER; HIGH CURRENTS; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); ION ENERGY DISTRIBUTION FUNCTIONS; LANTHANUM HEXABORIDES; PEAK CURRENTS; PLANAR MAGNETRON; PLASMA PROPERTIES; VOLTAGE OSCILLATION;

BORON; GAS SUPPLY; LANTHANUM COMPOUNDS;

PLASMAS;

EID: 84868355650     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4759310     Document Type: Article

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