Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

Surface and Coatings Technology

Volumn 206, Issue 11-12, 2012, Pages 2801-2809

  Stranak, Vitezslav ^a   Drache, Steffen ^a   Bogdanowicz, Robert ^a   Wulff, Harm ^a   Herrendorf, Ann Pierra ^a   Hubicka, Zdenek ^b   Cada, Martin ^b   Tichy, Milan ^c   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Dual magnetron; HiPIMS; IVDF; MF discharge; Ti Cu films; XRD

Indexed keywords

ANODE CATHODES; COMBINED SYSTEM; CRYSTALLOGRAPHIC PHASE; DEPOSITED FILMS; DUAL MAGNETRONS; DUTY CYCLES; HIGH ENERGY; HIPIMS; ION ENERGIES; ION VELOCITY DISTRIBUTION FUNCTION; IVDF; MAGNETRON GUNS; MID-FREQUENCY; PRE-IONIZATION; REDUCED PRESSURE; TIME-RESOLVED; WORKING PRESSURES; XRD;

CATHODES; DISTRIBUTION FUNCTIONS; HYBRID SYSTEMS; IONS; MAGNETRON SPUTTERING; METAL DRAWING; METALLIC FILMS; VELOCITY CONTROL;

COPPER;

EID: 84856424116     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.11.043     Document Type: Article

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