On sheath energization and Ohmic heating in sputtering magnetrons

Plasma Sources Science and Technology

Volumn 22, Issue 4, 2013, Pages

  Huo, Chunqing ^a   Lundin, Daniel ^a,b   Raadu, Michael A ^a   Anders, André ^c   Gudmundsson, Jon Tomas ^d,e   Brenning, Nils ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b UNIVERSITÉ PARIS SUD   (France)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d SHANGHAI JIAO TONG UNIVERSITY   (China)

^e UNIVERSITY OF ICELAND   (Iceland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGIZATION; ELECTRON POPULATION; EMITTED ELECTRON; EXPERIMENTAL DATUM; FITTING PROCEDURE; POTENTIAL PROFILES; PROBE MEASUREMENTS; SECONDARY ELECTRON EMISSIONS;

CATHODES; ELECTRIC DISCHARGES; ELECTRONS; MAGNETRON SPUTTERING; MAGNETRONS; PLASMA SHEATHS; VAPORS;

IONIZATION OF GASES;

EID: 84880583221     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/22/4/045005     Document Type: Article

References (27)

1. Thornton J A and Penfold A S 1978 Cylindrical magnetron sputtering in thin film processes Thin Film Processes vol 4 ed J L Vossen and W Kern (New York: Academic) pp 75-113
2. Gudmundsson J T, Brenning N, Lundin D and Helmersson U 2012 J. Vac. Sci. Technol. A 30 030801
3. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley) section 14.5
4. Thornton J A 1978 J. Vac. Sci. Technol. 15 171
5. Depla D, Mahieu S and Gryse De R 2009 Thin Solid Films 517 2825-39
6. Goree J and Sheridan T E 1991 Appl. Phys. Lett. 59 1052-4
7. Musschoot J and Haemers J 2010 Vacuum 84 488-93
8. Vlček J and Burcalová K 2010 Plasma Sources Sci. Technol. 19 065010
9. Kozák T, Vlček J and Kos Š 2013 J. Phys. D: Appl. Phys. 46 105203
10. Bradley J W, Thompson S and Gonzalvo Aranda Y 2001 Plasma Sources Sci. Technol. 10 490-501
11. Mishra A, Kelly P J and Bradley J W 2010 Plasma Sources Sci. Technol. 19 045014
12. Mishra A, Kelly P J and Bradley J W 2011 J. Phys. D: Appl. Phys. 44 425201
13. Rauch A, Mendelsberg R J, Sanders J M and Anders A 2012 J. Appl. Phys. 111 083302
14. Sigurjónsson P 2008 MSc Thesis University of Iceland, Science Institute Technical Report RH-14-2008
15. Huo C, Raadu M A, Lundin D, Gudmundsson J T, Anders A and Brenning N 2012 Plasma Sources Sci. Technol. 21 045004
16. Brenning N, Huo C, Lundin D, Raadu M A, Vitelaru C, Stancy G D, Minea T and Helmersson U 2012 Plasma Sources Sci. Technol. 21 025005
17. Raadu M A, Axnäs I, Gudmundsson J T, Huo C and Brenning N 2011 Plasma Sources Sci. Technol. 20 065007
18. Anders A, Andersson J and Ehiasarian A 2007 J. Appl. Phys. 102 113303
19. Brenning N, Axnäs I, Raadu M A, Lundin D and Helmerson U 2008 Plasma Sources Sci. Technol. 17 045009
20. Anders A, Capek J, Hála M and Martinu L 2012 J. Phys. D: Appl. Phys. 45 012003
21. Yamauchi Y and Shimizu R 1983 Japan. J. Appl. Phys. 22 L227
22. Baragiola R A, Alonso E V, Ferron J and Oliva-Florio A 1979 Surf. Sci. 90 240
23. Anders A 2008 Appl. Phys. Lett. 92 201501
24. Hecimovic A, Burcalova K and Ehiasarian A P 2008 J. Phys. D: Appl. Phys. 41 095203
25. Vetushka A, Karkari S K and Bradley J W 2004 J. Vac. Sci. Technol. A 22 2459
26. Welzel Th, Dunger Th, Liebig B and Richter F 2008 New J. Phys. 10 123008
27. Hosokawa N, Tsukada T and Kitahara H 1980 Proc. 8th Int. Vacuum Congress (Cannes, France, 22-26 September 1980) pp 11-14 (unpublished)