Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering

Surface and Coatings Technology

Volumn 222, Issue , 2013, Pages 112-117

  Stranak, Vitezslav ^a   Herrendorf, Ann Pierra ^a   Wulff, Harm ^a   Drache, Steffen ^a   Cada, Martin ^b   Hubicka, Zdenek ^b   Tichy, Milan ^c   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Anatase; ECWR; HiPIMS; IDF; Rutile; TiO2

Indexed keywords

ECWR; HIPIMS; IDF; RUTILE; TIO;

DEPOSITION RATES; DEPOSITS; ION BOMBARDMENT; MAGNETRON SPUTTERING; OXIDE MINERALS;

TITANIUM DIOXIDE;

EID: 84875810245     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.02.012     Document Type: Article

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