Filtered cathodic arc deposition with ion-species-selective bias

Review of Scientific Instruments

Volumn 78, Issue 6, 2007, Pages

  Anders, Andŕ ^a   Pasaja, Nitisak ^a,b   Sansongsiri, Sakon ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b CHIANG MAI UNIVERSITY   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON FILMS; CATHODES; DIAMONDS; ELECTRIC CONDUCTIVITY; METAL IONS; PLASMA WELDING; RAMAN SPECTROSCOPY; SPUTTERING; SUBSTRATES;

CARBON PLASMA; COMPUTER-CONTROLLED; S P2; S P3;

PLASMA SOURCES;

ION;

ARTICLE; CHEMISTRY; ELECTRODE; ELECTROPLATING INDUSTRY; EQUIPMENT; EQUIPMENT DESIGN; GAS; INSTRUMENTATION; METHODOLOGY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; SIGNAL PROCESSING;

ELECTRODES; ELECTROPLATING; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; GASES; IONS; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; SIGNAL PROCESSING, COMPUTER-ASSISTED;

EID: 34547304981     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2745229     Document Type: Article

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