Plasma-based physical vapor deposition surface engineering processes

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 5, 2003, Pages

  Matthews, Allan ^a  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; IONIZATION; PHYSICAL VAPOR DEPOSITION; PLASMA CONFINEMENT; THIN FILMS; TRIBOLOGY; EVAPORATION; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; SURFACES; VACUUM APPLICATIONS;

SURFACE ENGINEERING; ACTIVATED REACTIVE EVAPORATION; ARC EVAPORATION; IONIZATION ENHANCING TECHNIQUES; MAGNETIC PLASMA CONFINEMENT; PLASMA BASED PHYSICAL VAPOR DEPOSITION; THERMIONIC ASSISTANCE; TRIBOLOGICAL COATINGS; VACUUM PLASMA TECHNOLOGIES;

SURFACE STRUCTURE; PHYSICAL VAPOR DEPOSITION;

EID: 0142087590     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1599893     Document Type: Conference Paper

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