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Volumn 204, Issue 21-22, 2010, Pages 3349-3357

Industrial-scale deposition of highly adherent CNx films on steel substrates

Author keywords

Adhesion; Carbon nitride; CNx; HIPIMS; HPPMS

Indexed keywords

AMORPHOUS TRANSITION; CRITICAL LOAD; DAIMLER-BENZ; GRAPHITE TARGET; HIGH PURITY; HIGH-POWER; INTERFACIAL MIXING; MASTER-SLAVE CONFIGURATIONS; POLYCRYSTALLINE; POWER SUPPLY; PRE-TREATMENT; ROCKWELL; ROOM TEMPERATURE; SCALE DEPOSITION; SCRATCH TEST; STEEL SUBSTRATE; SUBSTRATE BIAS; TRANSMISSION MICROSCOPY; UNBALANCED MAGNETRON SPUTTERING;

EID: 77953719955     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.03.038     Document Type: Article
Times cited : (30)

References (55)
  • 7
    • 77953704540 scopus 로고    scopus 로고
    • "Beschichtungsverfahren und Vorrichtung zum Beschichten" (Coating process and device for coating): Germany - Patent # DE102008021912A1 Date: 05.11.2009.
    • E. Broitman, L. Hultman, and R. Cremer, "Beschichtungsverfahren und Vorrichtung zum Beschichten" (Coating process and device for coating) 2008: Germany - Patent # DE102008021912A1 Date: 05.11.2009.
    • (2008)
    • Broitman, E.1    Hultman, L.2    Cremer, R.3
  • 10
    • 77953708665 scopus 로고    scopus 로고
    • William Andrew Inc. Publishers: New York.
    • D.M. Mattox. 2003, William Andrew Inc. Publishers: New York. p. 34-36.
    • (2003) , pp. 34-36
    • Mattox, D.M.1
  • 11
    • 77953710161 scopus 로고    scopus 로고
    • Academic Press, New York, Chapter 4.9, D.M. Hoffman, B. Sing, J.H. Thomas (Eds.)
    • Mattox D.M. Handbook of Vacuum Technology 1998, Academic Press, New York, Chapter 4.9. D.M. Hoffman, B. Sing, J.H. Thomas (Eds.).
    • (1998) Handbook of Vacuum Technology
    • Mattox, D.M.1
  • 27
    • 0037179737 scopus 로고    scopus 로고
    • Anders A. Vacuum 2002, 67(3-4):673.
    • (2002) Vacuum , vol.67 , Issue.3-4 , pp. 673
    • Anders, A.1
  • 41
    • 77953718732 scopus 로고    scopus 로고
    • Databases used for research of scientific publications: SciFinder, Web of Science, and Google Scholar.
    • Databases used for research of scientific publications: SciFinder, Web of Science, and Google Scholar.
  • 42
    • 77953692113 scopus 로고    scopus 로고
    • Note
    • Bias power supply type BP12 manufactured by Huettinger Electronic.
  • 43
    • 77953721492 scopus 로고    scopus 로고
    • Vacuum treatment apparatus with additional voltage supply - Patent Application GB20060007269 20060411., Hauzer Techno Coating BV (NL); Univ Sheffield Hallam (GB): United Kingdom.
    • A.P. Ehiasarian, R. Tietema, P.E. Hovsepian, and D. Doerwald, Vacuum treatment apparatus with additional voltage supply - Patent Application GB20060007269 20060411. 2007, Hauzer Techno Coating BV (NL); Univ Sheffield Hallam (GB): United Kingdom.
    • (2007)
    • Ehiasarian, A.P.1    Tietema, R.2    Hovsepian, P.E.3    Doerwald, D.4
  • 46
    • 77953693410 scopus 로고    scopus 로고
    • Fundamentals of High Power Impulse Magnetron Sputtering, in Department of Physics, Chemistry and Biology (IFM)., Linköping University, Ph.D. Dissetation Nr. 1014.
    • J. Böhlmark, Fundamentals of High Power Impulse Magnetron Sputtering, in Department of Physics, Chemistry and Biology (IFM). 2006, Linköping University, Ph.D. Dissetation Nr. 1014. p. 64.
    • (2006) , pp. 64
    • Böhlmark, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.