Current-voltage-time characteristics of the reactive Ar/O 2 high power impulse magnetron sputtering discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 5, 2012, Pages

  Magnus, Fridrik ^a,c   Tryggvason, Tryggvi K ^a   Olafsson, Sveinn ^a   Gudmundsson, Jon T ^a,b  

^a UNIVERSITY OF ICELAND   (Iceland)

^b SHANGHAI JIAO TONG UNIVERSITY   (China)

^c UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT INCREASE; DISCHARGE CURRENTS; DISCHARGE VOLTAGES; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); LONG PULSE; PULSE REPETITION FREQUENCIES; SECONDARY ELECTRON EMISSIONS; TITANIUM TARGETS; WAVE FORMS;

MAGNETRON SPUTTERING; TITANIUM;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 84865484858     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4732735     Document Type: Article

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