Physics of arcing, and implications to sputter deposition

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 22-28

  Anders, André ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

373: plasma processing and deposition; 444: sputtering; Arcing; Target poisoning

Indexed keywords

CATHODES; DIELECTRIC MATERIALS; ELECTRON EMISSION; STRENGTH OF MATERIALS; THERMAL EFFECTS;

373: PLASMA PROCESSING AND DEPOSITION; 444: SPUTTERING; ARCING; TARGET POISONING;

SPUTTER DEPOSITION;

EID: 33344455112     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.228     Document Type: Conference Paper

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