Reactive deposition of Al-N coatings in Ar/N2 atmospheres using pulsed-DC or high power impulse magnetron sputtering discharges

Vacuum

Volumn 85, Issue 2, 2010, Pages 120-125

  Guillaumot, A ^a   Lapostolle, F ^a   Dublanche Tixier, C ^b   Oliveira, J C ^c   Billard, A ^a   Langlade, C ^a  

^a UNIVERSITÉ DE TECHNOLOGIE DE BELFORT MONTBÉLIARD   (France)

^b UNIVERSITY OF LIMOGES   (France)

^c UNIVERSITY OF COIMBRA   (Portugal)

Author keywords

Aluminium nitride; Hardness; HIPIMS; OES measurements; Structural properties

Indexed keywords

ALN; ALN THIN FILMS; ALUMINIUM NITRIDE; AVERAGE CURRENTS; HIGH POWER IMPULSE MAGNETRON SPUTTERING; HIGH-POWER; HIPIMS; NITROGEN FLOW; OES MEASUREMENTS; PULSED DC; REACTIVE DEPOSITION; REACTIVE GAS; X-RAY DIFFRACTION MEASUREMENTS;

ALUMINUM COMPOUNDS; COATINGS; DC POWER TRANSMISSION; DEPOSITION; EMISSION SPECTROSCOPY; HARDNESS; IONIZATION; MAGNETRON SPUTTERING; NITRIDES; OPTICAL EMISSION SPECTROSCOPY; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM;

EID: 77956619470     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.04.012     Document Type: Article

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