Inert gas effects on the deposition rate of TiO2 during reactive HiPIMS

Surface and Coatings Technology

Volumn 250, Issue , 2014, Pages 2-6

  Bowes, Michael ^a   Bradley, James W ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

Deposition rate; High power impulse magnetron sputtering; HiPIMS; Magnetron; Titanium oxide

Indexed keywords

DEPOSITION; DEPOSITION RATES; MAGNETRONS; MIXTURES; OXYGEN; TITANIUM; TITANIUM OXIDES;

DISCHARGE POWER; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIPIMS; OXYGEN PARTIAL PRESSURE; PULSE FREQUENCIES; TARGET POTENTIAL; TARGET SURFACE; TOTAL PRESSURE;

INERT GASES;

EID: 84899918817     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2014.02.009     Document Type: Article

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