Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallization

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4, 2000, Pages 1546-1549

  Klawuhn, E ^a   D'couto, G C ^a   Ashtiani, K A ^a   Rymer, P ^a   Biberger, M A ^a   Levy, K B ^a  

^a NOVELLUS SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; IONIZATION OF SOLIDS; MAGNETRONS; METALLIC FILMS; METALLIZING;

HOLLOW-CATHODE MAGNETRON (HCM) SOURCE; IONIZED PHYSICAL VAPOR DEPOSITION (IPVD);

VAPOR DEPOSITION;

EID: 0034224117     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582382     Document Type: Article

References (7)

1. D. B. Hayden, D. R. Juliano, K. M. Green, D. N. Ruzic, C. A. Weiss, K. A. Ashtiani, and T. J. Licata, J. Vac. Sci. Technol. A 16, 624 (1998).
2. K. Lai et al., J. Vac. Sci. Technol. (submitted); G. I. Font et al., ibid. (submitted).
3. K. Lai et al., J. Vac. Sci. Technol. (submitted); G. I. Font et al., ibid. (submitted).
4. Electrical and Pressure Probe Measurements of a Hollow Cathode Magnetron, K. Lai et al., presented at 46th AVS International Symposium, Seattle, Washington, October (1999).
5. Simulation and Experimental Measurements of a Hollow Cathode Magnetron Ionized Metal Plasma Deposition System, G. I. Font et al., Presented at 46th AVS International Symposium. Seattle, Washington, October (1999) (unpublished).
6. M. A. Biberger, S. Jackson, and E. R. Klawuhn, Proc. ISSP Conference, June (1997), p. 290.
7. D. Fischer et al., Proc. AMC Conference, October (1998), p. 337 (unpublished).