Erratum to "Plasma biasing to control the growth conditions of diamond-like carbon" [Surface and Coatings Technology 201(2007) 4628-4632] (DOI:10.1016/j.surfcoat.2006.09.313);Plasma biasing to control the growth conditions of diamond-like carbon

Surface and Coatings Technology

Volumn 201, Issue 8, 2007, Pages 4628-4632

  Anders, André ^a   Pasaja, Nitisak ^a,b   Lim, Sunnie H N ^a,c   Petersen, Tim C ^c   Keast, Vicki J ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b CHIANG MAI UNIVERSITY   (Thailand)

^c UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Diamond like carbon films; Electron energy loss spectroscopy; Plasma bias; Substrate bias; Transmission electron microscopy

Indexed keywords

AMORPHOUS FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; PLASMA SHEATHS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

PLASMA POTENTIAL; SUBSTRATE BIAS; SURFACE POTENTIAL DROPS;

DIAMOND LIKE CARBON FILMS;

AMORPHOUS FILMS; DIAMOND LIKE CARBON FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; PLASMA SHEATHS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

EID: 33845308546     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.06.019     Document Type: Erratum

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