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Journal of Physics D: Applied Physics

Volumn 46, Issue 8, 2013, Pages

Anatase and rutile TiO2 films deposited by arc-free deep oscillation magnetron sputtering

(5) Lin, Jianliang a Wang, Bo a Sproul, William D a,b Ou, Yixiang a Dahan, Isaac c

a Department of Metallurgical and Materials Engineering (United States)

b Reactive Sputtering INC (United States)

c NUCLEAR RESEARCH CENTER NEGEV (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE PHASE; CRYSTAL PHASE; GRAIN SIZE; HIGH-POWER PULSED MAGNETRON SPUTTERING; LOW DEPOSITION TEMPERATURE; MAGNETRON SPUTTERING SYSTEMS; NANO-CRYSTALLINE TIO; PEAK CURRENTS; PULSED DC MAGNETRON SPUTTERING; RUTILE PHASE; RUTILE TIO; STEEL SUBSTRATE; SUBSTRATE BIAS; TARGET CURRENTS; TIO;

CRYSTAL MICROSTRUCTURE; DEPOSITS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDE MINERALS; SUBSTRATES;

TITANIUM DIOXIDE;

EID: 84873915592 PISSN: 00223727 EISSN: 13616463 Source Type: Journal
DOI: 10.1088/0022-3727/46/8/084008 Document Type: Article

Times cited : (75)

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