Properties of titanium oxide film prepared by reactive cathodic vacuum arc deposition

Thin Solid Films

Volumn 348, Issue 1, 1999, Pages 145-151

  Takikawa, Hirofumi ^a   Matsui, Takaaki ^a   Sakakibara, Tateki ^a   Bendavid, Avi ^b   Martin, Philip J ^b  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; DEPOSITION; ELASTIC MODULI; GLASS; ION IMPLANTATION; MICROHARDNESS; OPTICAL PROPERTIES; PRESSURE; SUBSTRATES; TITANIUM OXIDES; VACUUM;

CRYSTALLINE ANATASE PHASE; EXTINCTION COEFFICIENT; GAS PRESSURE; MACROPARTICLE FILTERED ARC DEPOSITION; OPTICAL BANDGAP; SODA GLASS SUBSTRATE; UNFILTERED VACUUM ARC DEPOSITION;

THIN FILMS;

EID: 0032656082     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00054-1     Document Type: Article

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