A phenomenological model for the description of rotating spokes in HiPIMS discharges

Plasma Science and Technology

Volumn 22, Issue 5, 2013, Pages

  Gallian, S ^a   Hitchon, W N G ^b   Eremin, D ^a   Mussenbrock, T ^a   Brinkmann, R P ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b Wisconsin Electric Machines and Power Electronics Consortium   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COUPLED PARTIAL DIFFERENTIAL EQUATIONS; HIGH EMISSIVITY; NEUTRAL DENSITIES; PHENOMENOLOGICAL MODELING; PHYSICAL PARAMETERS; PLANAR MAGNETRON; ROTATING FRAME; ROTATION FREQUENCIES;

IONIZATION; OPTICAL WAVEGUIDES;

PLASMA DENSITY;

EID: 84885391407     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/22/5/055012     Document Type: Article

References (21)

1. Kouznetsov V, Macák K, Schneider J M, Helmersson U and Petrov I 1999 Surf. Coat. Technol. 122 290-3
2. Gudmundsson J T, Brenning N, Lundin D and Helmersson U 2012 J. Vacuum Sci. Technol. A 30 030801
3. Sarakinos K, Alami J and Konstantinidis S 2010 Surf. Coat. Technol. 204 1661-84
4. Anders A, Ni P and Rauch A 2012 J. Appl. Phys. 111 053304
5. Kozyrev A V, Sochugov N S, Oskomov K V, Zakharov A N and Odivanova A N 2011 Plasma Phys. Rep. 37 621-7
6. Ehiasarian A P, Hecimovic A, de los Arcos T, New R, von der Gathen V S, Böke M and Winter J 2012 Appl. Phys. Lett. 100 114101
7. Anders A 2012 Appl. Phys. Lett. 100 224104
8. Brenning N, Lundin D, Minea T, Costin C and Vitelaru C 2013 J. Phys. D: Appl. Phys. 46 084005
9. Raadu M A, Axnaes I, Gudmundsson J T, Huo C and Brenning N 2011 Plasma Sources Sci. Technol. 20 065007
10. Rossnagel S M 1998 J. Vacuum Sci. Technol. B 16 2585-608
11. Horwat D and Anders A 2010 J. Appl. Phys. 108 123306
12. Huo C, Raadu M A, Lundin D, Gudmundsson J T, Anders A and Brenning N 2012 Plasma Sources Sci. Technol. 21 045004
13. Winter J, Hecimovic A, de los Arcos T, Böke M and von der Gathen V S 2013 J. Phys. D: Appl. Phys. 46 084007
14. Hecimovic A, Gallian S, Brinkmann R P, Böke M and Winter J 2013 arXiv:1305.5453
15. Hecimovic A 2013 private communication
16. Lundin D, Helmersson U, Kirkpatrick S, Rohde S and Brenning N 2008 Plasma Sources Sci. Technol. 17 025007
17. Bohlmark J, Helmersson U, VanZeeland M, Axnäs I, Alami J and Brenning N 2004 Plasma Sources Sci. Technol. 13 654-61
18. Freund R S, Wetzel R C, Shul R J and Hayes T R 1990 Phys. Rev. A 41 3575-95
19. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley)
20. Ruzic D N 1990 Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Engineering (Park Ridge, NJ: Noyes Publications) pp 70-90
21. Hayward W H and Wolter A R 1969 J. Appl. Phys. 40 2911-16