Filtered vacuum arc deposition of undoped and doped ZnO thin films: Electrical, optical, and structural properties

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 3993-3999

  Goldsmith, S ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Doped ZnO; FVAD; Thin films; Vacuum arc; ZnO

Indexed keywords

DEPOSITION; ELECTRIC PROPERTIES; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; THIN FILMS; VACUUM APPLICATIONS;

DOPED ZINC OXIDE THIN FILMS; FILTERED VACUUM ARC DEPOSITION; POLYCRYSTALLINE SEMICONDUCTORS; STRUCTURAL PROPERTIES; UNDOPED ZINC OXIDE THIN FILMS;

SEMICONDUCTING ZINC COMPOUNDS;

DEPOSITION; ELECTRIC PROPERTIES; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING ZINC COMPOUNDS; THIN FILMS; VACUUM APPLICATIONS;

EID: 33751256568     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.007     Document Type: Article

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