A high-current pulsed cathodic vacuum arc plasma source

Review of Scientific Instruments

Volumn 74, Issue 11, 2003, Pages 4750-4754

  Oates, T W H ^a   Pigott, J ^a   Mckenzie, D R ^a   Bilek, M M M ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DEPOSITION; ELECTRIC CURRENTS; ELECTROLYTIC CAPACITORS; KINETIC ENERGY; MAGNETIC FIELDS; MAGNETIC FILTERS; MULTILAYERS; PLASMA DENSITY; PLASMA FLOW; ULTRATHIN FILMS; VACUUM APPLICATIONS;

CATHODIC VACUUM ARCS (CVA); METAL PLASMAS;

PLASMA SOURCES;

EID: 0344946084     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1614851     Document Type: Article

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