Development of CVD Ti-containing films

Progress in Materials Science

Volumn 58, Issue 8, 2013, Pages 1490-1533

  Jin, Na ^a   Yang, Yanqing ^a   Luo, Xian ^a   Xia, Zhenhai ^b  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

^b UNIVERSITY OF NORTH TEXAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; DEPOSITION;

BINARY FILMS; CHEMICAL VAPOR DEPOSITIONS (CVD); CVD METHOD; SPECIFIC PROPERTIES; SURFACE COATINGS; TERNARY FILM; TI FILM; TI PRECURSOR;

THIN FILMS;

EID: 84897114348     PISSN: 00796425     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.pmatsci.2013.07.001     Document Type: Review

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