Plasma CVD of hard coatings Ti(CNO) using metallo-organic compound Ti(OC3H7)4

Surface and Coatings Technology

Volumn 132, Issue 1, 2000, Pages 26-30

  Yulong, Shi ^a   Hongrui, Peng ^a   Yan, Xie ^a   Guangwen, Xie ^a   Cheng, Zhao ^a   Shizhi, Li ^a  

^a Qing Dao University of Science and Technology   (China)

Author keywords

Hard coatings; Metallo organic compound; Plasma CVD

Indexed keywords

BINDING ENERGY; COMPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROHARDNESS; ORGANOMETALLICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

COLUMNAR STRUCTURE; DEPOSITION RATE; HARD COATINGS;

PROTECTIVE COATINGS;

COATING; ORGANOMETALLIC COMPOUND; PLASMA TREATMENT; VAPOR DEPOSITION;

EID: 0034292448     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00743-X     Document Type: Article

References (9)