Nucleation and growth of Ti Si2 thin films deposited on glass by atmospheric pressure chemical vapor deposition

Journal of Applied Physics

Volumn 101, Issue 3, 2007, Pages

  Du, Jun ^a,b   Du, Piyi ^a   Xu, Ming ^a   Hao, Peng ^a   Huang, Yanfei ^a   Han, Gaorong ^a   Song, Chenlu ^a   Weng, Wenjian ^a   Wang, Jianxun ^a   Shen, Ge ^a  

^a ZHEJIANG UNIVERSITY   (China)

^b NANCHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FILM GROWTH; GLASS; NUCLEATION; THIN FILMS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; FOUR POINT PROBE METHOD; PHASE STRUCTURES;

TITANIUM COMPOUNDS;

EID: 33847116575     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2472274     Document Type: Article

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