Liquid injection MOCVD of TiO2 and SrTiO3 thin films from [Ti(OPri)2(tbaoac)2]: Film properties and compatibility with [Sr(thd)2]

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9135-9140

  Thomas, Reji ^a   Bhakta, Raghunandan ^b   Ehrhart, Peter ^a   Fischer, Roland A ^b   Waser, Rainer ^a   Devi, Anjana ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

ketoesters; Metalorganic precursors; MOCVD; SrTiO3; TiO2

Indexed keywords

CRYSTAL STRUCTURE; FILM GROWTH; STOICHIOMETRY; STRONTIUM COMPOUNDS; THIN FILMS; TITANIUM DIOXIDE;

CRYSTALLINE FILMS; FILM PROPERTIES; METALORGANIC PRECURSORS;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

CRYSTAL STRUCTURE; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; STOICHIOMETRY; STRONTIUM COMPOUNDS; THIN FILMS; TITANIUM DIOXIDE;

EID: 34547658081     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.038     Document Type: Article

References (19)

1. Won T., Yoon S., and Kim H. J. Electrochem. Soc. 139 (1992) 3284
2. Campbell S.A., Gilmer D.C., Wang X.-C., Hsieh M.-T., Kim H.-S., Gladfelter W.L., and Yan J. IEEE Trans. Electron Devices 44 (1997) 104
3. Gilmer D.C., Colombo D.G., Taylor C.J., Roberts J., Haugstad G., Campbell S.A., Kim H.-S., Wilk G.D., Gribelyuk M.A., and Gladfelter W.L. Chem. Vap. Depos. 4 (1998) 9
4. Cava R.F., Peck Jr. W.F., and Krajewski J.J. Nature (London) 377 (1995) 215
5. Moulson A.J., and Herbert J.M. Electroceramics: Materials, Properties and Applications (1990), Chapman and Hall, London (Chapters 6-8)
6. Kodas T., and Hampden-Smith M.J. The Chemistry of Metal CVD (1994), VCH Publishers, Weinheim, Germany
7. Pierson H.O. Handbook of Chemical Vapor Deposition (1992), Noyes, Park Ridge, NJ
8. In: Rees Jr. W.S. (Ed). CVD of Nonmetals (1996), VCH Verlagsgesellschaft mbH and VCH Publishers, Weinheim, Germany
9. Hubert-Pfalzgraf L.G., and Herve G. Appl. Organomet. Chem. 12 (1998) 221
10. Jones A.C., and Chalker P.R. J. Phys. D: Appl. Phys. 36 (2003) R80
11. Jones A.C. J. Mater. Chem. 12 (2002) 2576
12. Ehrhart P., Fitsilis F., Regnery S., Jia C., Waser R., Schienle F., Schumacher M., Dauelsberg M., Strzyzewski P., and Juergensen H. Integr. Ferroelectr. 30 (2000) 183
13. Ehrhart P., and Thomas R. J. Appl. Phys. 99 (2006) 114108
14. Regnery S., Ding Y., Ehrhart P., Jia C.L., Szot K., Thomas R., and Waser R. J. Appl. Phys. 98 (2005) 084904
15. R. Bhakta, Ph.D. Thesis, Ruhr Universität Bochum, (2005).
16. Bhakta R., Hipler F., Devi A., Regnery S., Ehrhart P., and Waser R. Chem. Vap. Depos. 9 (2003) 295
17. Bhakta R., Thomas R., Hipler F., Bettinger H., Müller J., Ehrhart P., and Devi A. J. Mater. Chem. 14 (2004) 3231
18. Thomas R., Regnery S., Ehrhart P., Waser R., Patil U., Bhakta R., and Devi A. Ferroelectrics 327 (2005) 111
19. Regnery S. Report of the Forschungszentrum Jülich (2005) (Jül-4159)