Characterization of TiO x film prepared by plasma enhanced chemical vapor deposition using a multi-jet hollow cathode plasma source

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 697-702

  Nakamura, Masatoshi ^a   Korzec, Dariusz ^b   Aoki, Toru ^b   Engemann, Jurgen ^a   Hatanaka, Yoshinori ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Hydrophilicity; Multi jet plasma source; PECVD; TiO x

Indexed keywords

FILM PREPARATION; FILMS; HYDROPHILICITY; LOW TEMPERATURE OPERATIONS; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

MULTI JET PLASMA SOURCE; TITANIUM TETRAISOPROPOXIDE;

TITANIUM DIOXIDE;

EID: 0035873446     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00140-4     Document Type: Article

References (15)

1. Mallouk T.E. Nature. 353:1991;698.
2. Vandrish G. Key Eng. Mater. 122:1996;185.
3. Ohko Y., Fujishima A. J. Phys. Chem. B. 102:1998;1724.
4. Ichikawa S., Doi R. Catal. Today. 27:1996;271.
5. Hashimoto K., Watanabe T. J. Surf. Sci. Soc. Jpn. 20:1999;85.
6. Watanabe T., Nakajima A., Wang R., Minabe M., Koizumi S., Fujishima A., Hashimoto K. Thin Solid Films. 351:1999;260.
7. Xu W.-X., Zhu S., Fu X.-C., Chen Q. Appl. Surf. Sci. 148:1999;253.
8. Amor S.B., Baud G., Besse J.P., Jacquet M. Thin Solid Films. 293:1997;163.
9. Lee J.S., Song H.W., Lee W.J., Yu B.G., No K. Thin Solid Films. 287:1996;120.
10. Martinet C., Palillard V., Ganaire A., Joseph J. J. Non-Cryst. Solids. 216:1997;77.
11. Ha H.-K., Yoshimoto M., Koinuma H., Moon B.-K., Ishiwara H. Appl. Phys. Lett. 68(21):1996;2965.
12. Mildner M., Korzec D., Engemann J. Surf. Coat. Technol. 112:1999;366.
13. Swanpole R. J. Phys. E: Sci. Instrum. 16:1983;1214.
14. Izutsu H. Mater. Res. Bull. 32:1997;1303.
15. Zeitler V.A., Brown C.A. J. Phys. Chem. 61:1957;1174.