Comparison of radio frequency and pulsed-d.c. plasma CVD of Ti-C-N-H and Zr-C-N-H layers at low temperature

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 661-664

  Wohle J ^a   Gebauer Teichmann, A ^b   Rie, K T ^c  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b ERAS GmbH   (Germany)

^c TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

Metal organic; Plasma CVD; Pulsed d.c. plasma; Radio frequency plasma; Wear resistant coatings

Indexed keywords

ALUMINUM ALLOYS; CHEMICAL VAPOR DEPOSITION; COATING TECHNIQUES; GRINDING (COMMINUTION); TITANIUM COMPOUNDS; WEAR RESISTANCE; ZIRCONIUM COMPOUNDS;

PLASMA POWER;

PLASMAS;

PLASMA TREATMENT;

EID: 0035387594     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01174-4     Document Type: Article

References (9)