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Chemical Vapor Deposition

Volumn 5, Issue 6, 1999, Pages 275-279

Mechanical properties and oxidation behavior of Ti-Si-N films prepared by plasma-assisted CVD

(2) Kim, Kwang Ho a Park, Bum Hee a

a Pusan National University (South Korea)

Author keywords

Anti oxidation; Microhardness; Microstructure; PACVD; Ti Si N film

Indexed keywords

EID: 0000846283 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(sici)1521-3862(199912)5:6<275::aid-cvde275>3.0.co;2-j Document Type: Article

Times cited : (34)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.