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Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1719-1723

Silicon nitride films by chemical vapor deposition in fluidized bed reactors at atmospheric pressure (AP/FBR-CVD)

(5) Perez Mariano, J a Borros, S a Picas, J A b Forn, A b Colominas, Carles a

a INSTITUT QUÍMIC DE SARRIÀ (Spain)

b UNIVERSITAT POLITÈCNICA DE CATALUNYA (Spain)

Author keywords

Chemical Vapor Deposition; FBR CVD; Fluidized bed; Silicon nitride

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL ACTIVATION; CHEMICAL VAPOR DEPOSITION; FLUIDIZED BEDS; HARDNESS; MECHANICAL PROPERTIES; MORPHOLOGY; STEEL; THERMAL EFFECTS; THIN FILMS;

CHROMIUM NITRIDE; FLUIDIZED BED REACTORS; SILICON NITRIDE FILMS;

SILICON NITRIDE;

COATING; FLUIDIZED BED; VAPOR DEPOSITION;

EID: 28944444848 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.08.069 Document Type: Article

Times cited : (12)

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