Deposition of TiN, TiC and Ti1-xAlxN coatings by pulsed d.c. plasma enhanced chemical vapour deposition methods

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 823-828

  Taschner Ch ^a   Ljungberg, B ^b   Hoffmann, V ^a   Vogt, C ^a   Leonhardt, A ^a  

^a IFW DRESDEN   (Germany)

^b AB Sandvik Coromant   (Sweden)

Author keywords

Pulsed d.c. plasma enhanced chemical vapour deposition; Ti1AlxN; TiC; TiN

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; EMISSION SPECTROSCOPY; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; TITANIUM;

HARD CRYSTALLINE COATINGS;

COATING TECHNIQUES;

COATING; HARDNESS; TITANIUM; TITANIUM CARBIDE; TITANIUM NITRIDE; TOUGHNESS; VAPOR DEPOSITION;

EID: 0035386393     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01117-3     Document Type: Article

References (23)