Preparation of SiNx and composite SiNx-TiN films from alkoxide solutions by liquid injection plasma CVD

Thin Solid Films

Volumn 419, Issue 1-2, 2002, Pages 54-59

  Shimada, Shiro ^a   Tsukurimichi, Kenichi ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

CVD; Liquid injection; Plasma; Silicon nitride; Titanium nitride

Indexed keywords

COMPOSITION; ELECTRIC CONDUCTIVITY; ETHANOL; MICROHARDNESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SOLUTIONS; SYNTHESIS (CHEMICAL); TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

LIQUID INJECTION;

THIN FILMS;

EID: 0036850804     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00768-X     Document Type: Article

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