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Volumn 148, Issue 2-3, 2001, Pages 251-255
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Kinetics and mechanism relevant to TiSiN chemical vapor deposition from TDMAT, silane and ammonia
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Author keywords
Kinetics; Molecular beam mass spectrometer; Silane; Tetrakis(dimethylamino)titanium; Ti Si N
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Indexed keywords
ACTIVATION ENERGY;
DECOMPOSITION;
HIGH TEMPERATURE EFFECTS;
MASS SPECTROMETERS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
RATE CONSTANTS;
SILANES;
TITANIUM COMPOUNDS;
GAS PHASE REACTIONS;
HARD COATINGS;
THIN FILMS;
COATING;
CUTTING TOOL;
HARDNESS;
KINETICS;
TITANIUM ALLOY;
VAPOR DEPOSITION;
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EID: 0035804031
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(01)01344-5 Document Type: Article |
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Times cited : (13)
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References (20)
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