Preparation of compositionally graded TiN-AlN and TiN-SiNx films from alkoxide solutions by liquid injection plasma CVD method

Journal of the Ceramic Society of Japan

Volumn 110, Issue 1281, 2002, Pages 444-449

  Shiro, Shimada ^a   Kenichi, Tsukurimichi ^b   Yoshikazu, Takada ^a   Junichi, Takahashi ^a   Hideaki, Nagai ^b  

^a HOKKAIDO UNIVERSITY   (Japan)

^b National Instisute of Advanced Materials Science and Technology

Author keywords

Alkoxide; Compositionally graded; CVD; Films; Liquid injection; Plasma; TiN AlN

Indexed keywords

AMINES; CHEMICAL BONDS; COMPOSITION; ELECTRIC CONDUCTIVITY; ETHANOL; INTERFACES (MATERIALS); METALLIC FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SILICON WAFERS; SOLUTIONS; SUBSTRATES; SURFACES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

LIQUID INJECTIONS;

TITANIUM COMPOUNDS;

EID: 0036564983     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)