MOCVD of TiO2 thin films and studies on the nature of molecular mechanisms involved in the decomposition of [Ti(OPri) 2(tbaoac)2]

Journal of Materials Chemistry

Volumn 14, Issue 21, 2004, Pages 3231-3238

  Bhakta, R ^a   Thomas, M ^b   Hipler, F ^c   Bettinger, H F ^a   Muller J ^d   Ehrhart, P ^b   Devi, A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c RuboChem   (Germany)

^d UNIVERSITY OF SASKATCHEWAN   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR DYNAMICS; PERMITTIVITY; PYROLYSIS; SUBSTRATES; THERMAL EFFECTS; TITANIUM OXIDES;

EQUIVALENT OXIDE THICKNESS (EOT); SUBSTRATE TEMPERATURES; TAILORED PRECURSORS;

THIN FILMS;

BIS(ISOPROPOXY)BIS(TERT BUTYLACETOACETATO)TITANIUM; KETENE DERIVATIVE; PLATINUM; SILICON DERIVATIVE; TITANIUM DIOXIDE; UNCLASSIFIED DRUG;

CHEMICAL REACTION; CHEMICAL VAPOR DEPOSITION; CONFERENCE PAPER; DECOMPOSITION; DIELECTRIC CONSTANT; FILM; INFRARED SPECTROSCOPY; SURFACE PROPERTY; TEMPERATURE; VAPOR; VAPORIZATION;

EID: 9244256735     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b405963h     Document Type: Conference Paper

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