Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system

Surface and Coatings Technology

Volumn 204, Issue 14, 2010, Pages 2111-2117

  Gong, Yansheng ^a   Tu, Rong ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

High speed deposition; LCVD; Microstructure; TDEAT; TiNx films

Indexed keywords

ARGON-ION LASER; CROSS SECTION; HIGH SPEED DEPOSITION; LASER CHEMICAL VAPOR DEPOSITION; LASER POWER; LATTICE PARAMETERS; LCVD; ND : YAG LASERS; SINGLE PHASE; SOURCE MATERIAL; TETRAKIS; TITANIUM NITRIDE FILMS; WIDE AREA;

AMMONIA; ARGON; ARGON LASERS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DEPOSITION RATES; EXCIMER LASERS; GAS LASERS; MICROSTRUCTURE; NEODYMIUM LASERS; TITANIUM;

TITANIUM NITRIDE;

EID: 76349090672     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.10.042     Document Type: Article

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