Optimization of selective TiSi2 chemical vapor deposition by mechanistic chemical kinetics

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 928-934

  Southwell, R P ^a   Mendicino, M A ^a   Seebauer, E G ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000648128     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580417     Document Type: Article

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