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Thin Solid Films

Volumn 398-399, Issue , 2001, Pages 343-348

An analysis of the TiN plasmachemical vapor deposition process based on optical emission spectroscopy measurements

(5) Peter, S a Giegengack, H a Richter, F a Tabersky, R a Konig U a

a CHEMNITZ UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

Optical emission spectroscopy; Plasma diagnostics; Plasmachemical vapor deposition; Titanium nitride

Indexed keywords

CRYSTALLOGRAPHY; CURRENT DENSITY; DEPOSITION; EMISSION SPECTROSCOPY; ETCHING; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; VICKERS HARDNESS TESTING;

OPTICAL EMISSION SPECTROSCOPY;

TITANIUM NITRIDE;

EID: 0035506981 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01375-X Document Type: Conference Paper

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.