Preparation and properties of titanium silicide coating glass by CVD

Journal of Non-Crystalline Solids

Volumn 354, Issue 12-13, 2008, Pages 1308-1313

  Du, Jun ^a,b   Du, Piyi ^a   Xu, Ming ^a   Han, Gaorong ^a   Weng, Wenjian ^a   Wang, Jianxun ^a  

^a ZHEJIANG UNIVERSITY   (China)

^b NANCHANG UNIVERSITY   (China)

Author keywords

Chemical vapor deposition; Conductivity; Reflectivity

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; GLASS; INORGANIC COATINGS; REFLECTION; SUBSTRATES; SYNTHESIS (CHEMICAL); TITANIUM COMPOUNDS; X RAY DIFFRACTION;

ORTHORHOMBIC STRUCTURE; PRECURSORS; TITANIUM SILICIDE;

THIN FILMS;

EID: 38649112028     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.11.038     Document Type: Article

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