Deposition of TiN films on various substrates from alkoxide solution by plasma-enhanced CVD

Surface and Coatings Technology

Volumn 199, Issue 1, 2005, Pages 72-76

  Shimada, Shiro ^a   Takada, Yoshikazu ^a   Tsujino, Jiro ^b  

^a HOKKAIDO UNIVERSITY   (Japan)

^b Hokkaido Electric Power Co Inc   (Japan)

Author keywords

Alkoxide nitrogen; SEM; Titanium nitride; X ray diffraction PACVD

Indexed keywords

COAGULATION; CRYSTALLIZATION; DEPOSITION; IMPURITIES; PARAMETER ESTIMATION; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SOLUTIONS; SUBSTRATES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

COLUMNAR STRUCTURES; FEED RATE; FLOW RATE; TITANIUM TETRA-ETHOXIDE (TTEO) SOLUTION;

THIN FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 21844453909     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.092     Document Type: Article

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