The growth of Ti3SiC2 coatings onto SiC by reactive chemical vapor deposition using H2 and TiCl4

Surface and Coatings Technology

Volumn 201, Issue 6, 2006, Pages 3748-3755

  Fakih, H ^a   Jacques, S ^a   Berthet, M P ^a   Bosselet, F ^a   Dezellus, O ^a   Viala, J C ^a  

^a UNIVERSITÉ CLAUDE BERNARD LYON 1   (France)

Author keywords

Multilayer coating; Reactive CVD; Solid gas reaction; Ti3SiC2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MULTILAYERS; SILICON CARBIDE; THERMODYNAMICS;

MULTILAYER COATING; REACTIVE CHEMICAL VAPOR DEPOSITION; SOLID-GAS REACTION;

INORGANIC COATINGS;

CHEMICAL VAPOR DEPOSITION; INORGANIC COATINGS; MULTILAYERS; SILICON CARBIDE; THERMODYNAMICS;

EID: 33751209779     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.09.040     Document Type: Article

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