Plasma enhanced chemical vapor deposition of TiO2 films on silica gel powders at atmospheric pressure in a circulating fluidized bed reactor

Chemical Engineering and Processing: Process Intensification

Volumn 48, Issue 6, 2009, Pages 1135-1139

  Kim, Gook Hee ^a   Kim, Sang Done ^a   Park, Soung Hee ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Woosuk University   (South Korea)

Author keywords

Anatase; Atmospheric pressure; CFB; PECVD; Photocatalyst

Indexed keywords

ANATASE; ANATASE PHASE; ANATASE TIO; AQUEOUS SOLUTIONS; ARGON CONCENTRATION; CFB; CIRCULATING FLUIDIZED BED REACTOR; DEPOSITION TEMPERATURES; HELIUM GAS; METHYLENE BLUE; OPTIMUM CONDITIONS; OPTIMUM DEPOSITION; PECVD; PHOTOCATALYTIC ACTIVITIES; POST TREATMENT; RAMAN SCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPES; SILICA GEL POWDER; SOLID CIRCULATION RATES; TIO; UV LIGHT;

ARGON; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; FLUID CATALYTIC CRACKING; FLUID DYNAMICS; FLUIDIZATION; FLUIDIZED BED PROCESS; FLUIDIZED BEDS; GELATION; GLOW DISCHARGES; HELIUM; LIGHT; ORGANIC POLYMERS; OXYGEN; PHOTOCATALYSIS; PLASMA DEPOSITION; PLASMAS; POWDERS; SCANNING ELECTRON MICROSCOPY; SILICA; SILICA GEL; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES; VAPORS; X RAY DIFFRACTION ANALYSIS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 67349198519     PISSN: 02552701     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cep.2009.03.008     Document Type: Article

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