Deposition of bismuth-titanate films with liquid-delivery spin MO-CVD

Materials Science and Engineering: B

Volumn 144, Issue 1-3, 2007, Pages 132-137

  Schwarzkopf, J ^a   Dirsyte, R ^a   Rossberg, M ^a   Wagner, G ^a   Fornari, R ^a  

^a LEIBNIZ INSTITUTE FOR CRYSTAL GROWTH   (Germany)

Author keywords

Bismuth titanate films; Liquid delivery MO CVD; Raman; Structural properties; XRD

Indexed keywords

BISMUTH COMPOUNDS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; EPITAXIAL GROWTH; RAMAN SCATTERING; STRUCTURAL PROPERTIES; TITANIUM COMPOUNDS; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY;

BISMUTH-TITANATE FILMS; LIQUID SOLUTIONS; LIQUID-DELIVERY MO-CVD; STRUCTURAL QUALITY;

THIN FILMS;

EID: 35748953406     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.07.065     Document Type: Article

References (21)

1. Scott J.F., and Paz de Araujo C.A. Science 246 (1989) 1400
2. Paz de Araujo C.A., Cuchiaro J.D., McMillan L.D., Scott M.C., and Scott J.F. Nature 374 (1995) 627
3. Cummins S.E., and Cross L.E. J. Appl. Phys. 39 (1968) 2268
4. Park B.H., Kang B.S., Bu S.D., Noh T.W., Lee J., and Jo W. Nature 401 (1999) 682
5. Choi K.J., Biegalski M., Li Y.L., Sharan A., Schubert J., Uecker R., Reiche P., Chen Y.B., Pan X.Q., Gopalan V., Chen L.-Q., Schlom D.G., and Eom C.B. Science 306 (2004) 1005
6. Haeni J.H., Irvin P., Chang W., Uecker R., Reiche P., Li Y.L., Choudhury S., Tian W., Hawley M.E., Craigo B., Tagantsev A.K., Pan X.Q., Streiffer S.K., Chen L.Q., Kirchoefer S.W., Levy J., and Schlom D.G. Nature 430 (2004) 758
7. Takei W.J., Formigoni N.P., and Francombe M.H. Appl. Phys. Lett. 15 (1969) 256
8. Ramesh R., Inam A., Wilkens B., Chan W.K., Sands T., Fork D.K., Geballe T.H., Evans J., and Bullington J. Appl. Phys. Lett. 59 (1991) 1782
9. Theis C.D., Yeh J., Schlom D.G., Hawley M.E., Brown G.W., Jiang J.C., and Pan X.Q. Appl. Phys. Lett. 72 (1998) 2817
10. Watanabe T., Funakubo H., and Saito K. J. Mater. Res. 16 (2001) 303
11. Wright P.J., Crossbie M.J., Lane P.A., Williams D.J., Jones A.C., Leedham T.J., and Davies H.O. J. Mater. Sci.: Mater. Electron. 13 (2002) 671
12. Ramesh R., Aggarwal S., and Auciello O. Mater. Sci. Eng. 32 (2001) 191
13. Roeder J.F., Baum T.H., Bilodeau S.M., Stauf G.T., Ragaglia C., Russell M.W., and Van Buskirk P.C. Adv. Mater. Opt. Electron. 10 (2000) 145
14. Meng J.F., Katiyar R.S., and Zou G.T. J. Raman Spectrosc. 28 (1997) 797
15. Idink H., Srikant V., White W.B., and Subbarao E.C. J. Appl. Phys. 76 (1994) 1819
16. Du Y.L., Zhang M.S., Chen Q., and Yin Z. Appl. Phys. A 76 (2003) 1099
17. Yau C.Y., Palan R., Tran K., and Buchanan R.C. Appl. Phys. Lett. 85 (2004) 4714
18. Lee H.N., Zakharov D.N., Senz S., Pignolet A., and Hesse D. Appl. Phys. Lett. 79 (2001) 2961
19. Wills L.A., Feil W.A., Wessels B.W., Tonge L.M., and Marks T.J. J. Cryst. Growth 107 (1991) 712
20. Schäfer P., and Waser R. Adv. Mater. Opt. Electron. 10 (2000) 169
21. Rae A.D., Thomson J.G., Withers R.L., and Willis A.C. Acta Cryst. B 46 (1990) 474