Deposition of Ti-B-N films by ICP assisted sputtering

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 638-642

  Jung, D H ^a   Kim, H ^a   Lee, G R ^a   Park, B ^a   Lee, J J ^a   Joo, J H ^b  

^a Seoul National University   (South Korea)

^b Kunsan National University   (South Korea)

Author keywords

Bias voltage; DC magnetron; Ti B N coatings

Indexed keywords

ELECTRIC POTENTIAL; INDUCTIVELY COUPLED PLASMA; MAGNETRON SPUTTERING; MIXTURES; TITANIUM COMPOUNDS;

BIAS VOLTAGES;

THIN FILMS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0042829231     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00651-0     Document Type: Article

References (13)

1. Pierson J.F. Bertran F. Bauer J.P. Jolly J. Surf. Coat. Technol. 142-144 2001 906
2. Pierson J.F. Tomasella E. Bauer Ph. Thin solid Films 408 2002 26
3. Mollart T.P. Haupt J. Gilmore R. Gissler W. Surf. Coat. Technol. 86-87 1996 231
4. Wiedemann R. Weihnacht V. Oettel H. Surf. Coat. Technol. 116-119 1999 302
5. Wiedemann R. Oettel H. Jerennz M. Surf. Coat. Technol. 97 1997 313
6. Losbichler P. Mitterer C. Gibson P.N. Gissler W. Hofer F. Warbichler P. Surf. Coat. Technol. 94-95 1997 297
7. Wong M.S. Lee T.C. Surf. Coat. Technol. 120-121 1999 194
8. Heau C. Terrat J.P. Surf. Coat. Technol. 108-109 1998 332
9. Deng H. Chen J. Inturi R.B. Barnard J.A. Surf. Coat. Technol. 76-77 1995 609
10. Lim J.W. Park H.S. Park T.H. Lee J.J. J. Vac. Sci. Technol. A18 2 2000 524
11. Park H.S. Jung D.H. Na H.D. Lee J.J. Surf. Coat. Technol. 142-144 2001 999
12. Rossnagel S.M. Hopwood J. J. Vac. Sci. Technol. B 12 1 1994 449
13. Hopwood J. Qian F. J. Appl. Phys. 78 2 1995 798