Chemical vapor deposition of phase-rich WC thin films on silicon and carbon substrates

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 3847-3854

  Beadle, Kendra A ^a   Gupta, Rahul ^a   Mathew, Anoop ^b   Chen, Jingguang G ^a   Willis, Brian G ^a  

^a University of Delaware   (United States)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

CVD; Electrocatalysts; Tungsten carbide (WC) films; XPS; XRD

Indexed keywords

ELECTROCATALYSTS; TUNGSTEN CARBIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON SUBSTRATES; TUNGSTEN CARBIDE (WC) FILMS;

THIN FILMS;

EID: 40749087973     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.170     Document Type: Article

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