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Chemical Vapor Deposition

Volumn 11, Issue 10, 2005, Pages 399-403

CVD of thin titanium dioxide films using hexanuclear titanium oxo carboxylate isopropoxides

(5) Piszczek, Piotr a Richert, Monika a Grodzicki, Antoni a Talik, Ewa b Heimann, Jan b

a NICOLAUS COPERNICUS UNIVERSITY (Poland)

b UNIVERSITY OF SILESIA (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTALLIZATION; FILM GROWTH; GRAIN GROWTH; IMPURITIES; MORPHOLOGY; SILICON COMPOUNDS; SURFACES; TITANIUM DIOXIDE;

CARRIER GAS; LARGE-GRAIN; SI(II) SUBSTRATES; THIN TITANIUM DIOXIDE FILMS;

THIN FILMS;

EID: 27744477743 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/cvde.200504214 Document Type: Article

Times cited : (8)

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