Comparison study of physical vapor-deposited and chemical vapor-deposited titanium nitride thin films using X-ray photoelectron spectroscopy

Applied Surface Science

Volumn 158, Issue 3, 2000, Pages 246-251

  Zhao, Jin ^a   Garza, E Gene ^a   Lam, Kinsang ^a   Jones, Clive M ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; COMPOSITION; HYDROGEN; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

PHYSICAL VAPOR DEPOSITION; PLASMA TREATMENT;

THIN FILMS;

EID: 0033691563     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00024-6     Document Type: Article

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