Growth of titanium silicate thin films by photo-induced chemical vapor deposition

Thin Solid Films

Volumn 453-454, Issue , 2004, Pages 167-171

  Wang, Z M ^a   Fang, Q ^b   Zhang, J Y ^a   Wu, J X ^a   Di, Y ^a   Chen, W ^a   Chen, M L ^a   Boyd, Ian W ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Excimer lamp; High k dielectrics; Photo CVD; Titanium silicate

Indexed keywords

ABSORPTION; CHEMICAL VAPOR DEPOSITION; COMPOSITION; DIELECTRIC MATERIALS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOCHEMICAL REACTIONS; REFRACTIVE INDEX; SOLUTIONS; TITANIUM COMPOUNDS; ULTRAVIOLET DEVICES; X RAY PHOTOELECTRON SPECTROSCOPY;

EXCIMER LAMPS; HIGH-K DIELECTRICS; PHOTO-CVD; TITANIUM SILICATES;

THIN FILMS;

EID: 1542741164     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.093     Document Type: Conference Paper

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