Thermochemical aspects on the formation of Ti-bearing coatings in a fluidized bed CVD process

Surface and Coatings Technology

Volumn 78, Issue 1-3, 1996, Pages 72-77

  Angelopoulos, G N ^a   Kinkel, S ^b   Voudouris, N ^a  

^a UNIVERSITY OF PATRAS   (Greece)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Chemical vapour deposition; Fluidized bed; Thermochemical calculations; Ti coatings

Indexed keywords

ALUMINA; CALCULATIONS; CHEMICAL VAPOR DEPOSITION; FLUIDIZED BEDS; IRON COMPOUNDS; NITROGEN COMPOUNDS; SILICA; STEEL; SURFACE TREATMENT; TEMPERATURE; THERMODYNAMICS; TITANIUM;

FLUIDIZED BED CHEMICAL VAPOR DEPOSITION; METALLIC POWDERS; THERMOCHEMICAL ASPECT; THERMOCHEMICAL CALCULATIONS;

COATINGS;

COATINGS; FLUIDIZED BEDS; TITANIUM BEARINGS;

EID: 0029656732     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(94)02394-8     Document Type: Article

References (14)

1. S. Kinkel, G. N. Angelopoulos and W. Dahl, Formation of TiC coatings on steels by a fluidized bed chemical vapour deposition process, Surf. Coat. Technol., 64 (1994) 119.
2. G. Erikkson and K. Hack, CHEMSAGE: A COMPUTER PROGRAM FOR THE CALCULATION OF COMPLEX CHEMICAL EQUILIBRIA, Metall. Trans. B. 21 (1990) 1013.
3. F. van Zeggeren and S.H. Storey, The Computation of Chemical Equilibria, Cambridge University Press, Cambridge, 1970.
4. C.E. Morosanu, Thin Films by Chemical Vapour Deposition, Elsevier, Amsterdam, 1990, p. 95.
5. B. Noläng, Equilibrium computations and their application to CVD systems, in J. O. Carlsson and J. Lindström (eds.), Proc. Fifth Eur. Conf. on CVD, Uppsala, 1985, pp. 107-14.
6. A. Sanjurjo, B.J. Wood, K.H. Lan, G.T. Tong, D.K. Choi, M.C.H. McKubre and H.K. Chong, Titanium based coatings on copper by chemical vapour deposition in fluidized bed reactors, Surf. Coat. Technol., 49 (1991) 110.
7. B.J. Wood, A. Sanjurjo, G.T. Tong and S.E. Swider, Coating particles by chemical vapour deposition in fluidized bed reactors, Surf. Coat. Technol., 49 (1991) 228.
8. L. Vandenbulcke, Thermodynamic approach to the deposition of nonstoichiometric solids from the gas pase: example of titanium carbide at high temperatures, J. Electrochem. Soc., 128 (1981) 1584.
9. M. Ducarroir and M. Jaymes, Determination des équilibres chimiques complexes dans les systèmes polyphasés, J. Less-Common Met., 40 (1975) 173.
10. J.J. Nickl, M. Reichle and R. Vesper, in F.A. Glaski (ed.), Proc. 3rd Int. Conf. on CVD, The American Nuclear Society, New York, 1972, pp. 369-82.
11. A. Aquero and P. Lowden, A novel industrial CVD process for TiN coatings at low temperature, in T. S. Sudarshan and D. G. Bhat (eds.), Proc. Fourth Int. Conf. on Surface Modification Technology., Minerals, Metals and Materials Society, Paris, 1990.
12. S.C. Kung and R.A. Rapp, Analyses of the gaseous species in halide activated cementation coating packs, Oxid. Met., 32 (1989) 89.
13. P.J. Spencer and K. Hack, Swiss Mater., 2 (1990) 69.
14. P.P.J. Ramaeker, F.J.J. van Loo and R. Metschlar, Growth processes and carbide composition in the CVD of TiC, in J.O. Carlsson and J. Lindström (eds.), Proc. Fifth Eur. Conf. on CVD, Uppsala, 1985, pp. 354-63.