Plasma-enhanced CVD of (Ti, Al)N films from chloridic precursors in a DC glow discharge

Surface and Coatings Technology

Volumn 133, Issue 134, 2000, Pages 208-214

  Prange, R ^a   Cremer, R ^a   Neuschutz D ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COATING; FILM; VAPOR DEPOSITION;

ANNEALING; GLOW DISCHARGES; METALLIC FILMS; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TEXTURES;

TITANIUM ALUMINUM NITRIDE;

TITANIUM NITRIDE;

EID: 0034490607     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00941-5     Document Type: Article

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