Metal organic chemical vapor deposition (MOCVD) of oxides and ferroelectric materials

Journal of Materials Science: Materials in Electronics

Volumn 13, Issue 11, 2002, Pages 671-678

  Wright, P J ^a   Crosbie, M J ^a   Lane, P A ^a   Williams, D J ^a   Jones, A C ^b   Leedham, T J ^c   Davies, H O ^c  

^a QINETIQ   (United Kingdom)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

^c Inorgtech Limited   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTROMECHANICAL DEVICES; OPTOELECTRONIC DEVICES; SUPERCONDUCTING MATERIALS; THIN FILMS;

LIQUID DELIVERY TECHNIQUES;

FERROELECTRIC MATERIALS;

EID: 0036863047     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1020618411750     Document Type: Article

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