Growth and properties of chemical-vapor-deposited Ti-P-O films grown under the CO2- and H2-existing conditions

Journal of Non-Crystalline Solids

Volumn 337, Issue 2, 2004, Pages 115-120

  Kuo, Dong Hau ^a   Tseng, Wen Cheng ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; DEPOSITION; ELECTRODES; MORPHOLOGY; THIN FILMS; TITANIUM COMPOUNDS;

FILM COMPOSITION; INTERNAL STRESS; NANOPARTICLES; TITANIUM PHOSPHATES;

FILM GROWTH;

EID: 2942609152     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.04.002     Document Type: Article

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