PECVD of amorphous TiO2 thin films: Effect of growth temperature and plasma gas composition

Thin Solid Films

Volumn 371, Issue 1, 2000, Pages 126-131

  Battiston, G A ^a   Gerbasi, R ^a   Gregori, A ^a   Porchia, M ^a   Cattarin, S ^a   Rizzi, G A ^b  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS; THIN FILMS; TITANIUM DIOXIDE; TITANIUM NITRIDE;

PLASMA GASES;

AMORPHOUS FILMS;

EID: 0033715074     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00998-6     Document Type: Article

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